cas 195000-66-9|| where to buy 2-Methylacrylic acid 2-oxo-tetrahydrofuran-3-yl ester

Produktname:2-Methylacrylic acid 2-oxo-tetrahydrofuran-3-yl ester

IUPAC Name:2-oxooxolan-3-yl 2-methylprop-2-enoate

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CM374920-1g	in stock	ƥŗ

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: CAS-Nr.:195000-66-9; Molekulare Formel:C8H10O4; Schmelzpunkt:-; SMILES-Code:CC(=C)C(=O)OC1CCOC1=O; Dichte:

: Katalognummer:CM374920; Molekulargewicht:170.16; Siedepunkt:; Mdl-Nr.:; Lagerung:

: Tetrahydrofurans; Tetrahydrofuran is a heterocyclic organic compound with the molecular formula C4H8O. Tetrahydrofuran belongs to ethers and is the complete hydrogenation product of furan. It is a colorless, water-miscible organic liquid with small viscosity at normal temperature and pressure. Because of its long liquid range, it is a commonly used medium polar aprotic solvent. Its main use is as a precursor of high molecular polymers.

: Photoresist; Semiconductors could be termed as the most extensively utilized substance in the modern century. Polycrystalline wafers are used to make semiconductors. A single 300-mm silicon wafer may create hundreds of chips. Photoresist coatings and materials are an essential part of their fabrication as they are the main constituents of the photolithography process during the fabrication of the semiconductors. Photoresist is a mixed liquid that is sensitive to light. Its components include: photoinitiators (including photosensitizers, photoacid generators), photoresist resins, monomers, solvents and other additives. The photoresist can transfer the required fine pattern from the photomask (mask) to the substrate to be processed through photochemical reaction and photolithography processes such as exposure and development.